- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 7/09 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers
Patent holdings for IPC class G03F 7/09
Total number of patents in this class: 1491
10-year publication summary
119
|
118
|
161
|
114
|
167
|
133
|
133
|
80
|
107
|
31
|
2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
FUJIFILM Corporation | 27102 |
153 |
Shin-Etsu Chemical Co., Ltd. | 5132 |
121 |
Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
110 |
Nissan Chemical Industries, Ltd. | 1822 |
89 |
Rohm and Haas Electronic Materials LLC | 637 |
58 |
JSR Corporation | 2476 |
47 |
Tokyo Electron Limited | 11599 |
46 |
Merck Patent GmbH | 5909 |
37 |
Samsung SDI Co., Ltd. | 6671 |
37 |
International Business Machines Corporation | 60644 |
31 |
Samsung Electronics Co., Ltd. | 131630 |
29 |
Cheil Industries Inc. | 944 |
20 |
Rohm and Haas Electronic Materials Korea Ltd. | 546 |
20 |
Applied Materials, Inc. | 16587 |
19 |
AZ Electronic Materials USA Corp. | 74 |
18 |
Eastman Kodak Company | 3444 |
17 |
Toray Industries, Inc. | 6652 |
17 |
Tokyo Ohka Kogyo Co., Ltd. | 1481 |
17 |
AZ Electronic Materials USA Corp. | 48 |
17 |
Nissan Chemical Corporation | 1725 |
16 |
Other owners | 572 |